• sputtering-targets

    Sputtering 

    Targets

    Heeger Materials (HM) provides various of sputtering targets at a competitive price. HM stocks a vast assortment of sputtering targets and provides customized services.

  • Refractory Metals

    Refractory

    Metals

    Heeger Materials (HM) provides various of refractory metals at a competitive price. HM stocks a vast assortment of refractory metals and provides customized services.

  • Inquiry

    Tin Zinc (Sn/Zn) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Tin Zinc (Sn/Zn) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Germanium Sulfide (GeS) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium Sulfide (GeS) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Copper Oxide (CuO) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Oxide (CuO) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Tantalum Silicide (TaSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Tantalum Silicide (TaSi2) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Cesium Fluoride (CsF) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cesium Fluoride (CsF) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Zirconium Oxide (ZrO2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zirconium Oxide (ZrO2) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Zirconium Fluoride (ZrF4) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zirconium Fluoride (ZrF4) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Germanium Nitride (Ge3N4) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium Nitride (Ge3N4) Sputtering Targets with the highest possible density and the lowest prices.

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