• sputtering-targets

    Sputtering 

    Targets

    Heeger Materials (HM) provides various of sputtering targets at a competitive price. HM stocks a vast assortment of sputtering targets and provides customized services.

  • Refractory Metals

    Refractory

    Metals

    Heeger Materials (HM) provides various of refractory metals at a competitive price. HM stocks a vast assortment of refractory metals and provides customized services.

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    Nickel Silicide (NiSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Nickel Silicide (NiSi2) Sputtering Targets with the highest possible density and the lowest prices.

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    Thorium Fluoride (ThF4) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Thorium Fluoride (ThF4) Sputtering Targets with the highest possible density and the lowest prices.

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    Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets with the highest possible density...

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    Zinc Tin (Zn/Sn) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zinc Tin (Zn/Sn) Sputtering Targets with the highest possible density and the lowest prices.

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    Titanium Nitride (TiN) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Nitride (TiN) Sputtering Target with the highest possible density and the lowest prices.

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    Barium Zirconate (BaZrO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium Zirconate (BaZrO3) Sputtering Targets with the highest possible density and the lowest prices.

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    Erbium Oxide (Er2O3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Erbium Oxide (Er2O3) Sputtering Targets with the highest possible density and the lowest prices.

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    Iridium (Ir) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Iridium (Ir) Sputtering Targets with the highest possible density and the lowest prices.

Heeger Materials Inc

Heeger Materials Inc - Advanced Material Supplier

Your materials specialist of high purity powder, metal and alloy.

Heeger Materials Inc is a global manufacturer and distributor of advanced materials with a more than 20,000 online products catalog and compendium of information on the chemical elements, advanced materials, and high technology applications. Our main materials are Rare Earth Materials, Refractory Metals, Thin Film Materials and High Purity Materials. Our advanced materials make your world better, enabling technologies to provide a safer, more sustainable future.