• sputtering-targets

    Sputtering 

    Targets

    Heeger Materials (HM) provides various of sputtering targets at a competitive price. HM stocks a vast assortment of sputtering targets and provides customized services.

  • Refractory Metals

    Refractory

    Metals

    Heeger Materials (HM) provides various of refractory metals at a competitive price. HM stocks a vast assortment of refractory metals and provides customized services.

  • Inquiry

    Zirconium Boride (ZrB2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zirconium Boride (ZrB2) Sputtering Targets with the highest possible density and the lowest prices.

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  • $345.55
    Sale!

    Inquiry

    Titanium Monoxide (TiO) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Monoxide (TiO) Sputtering Target with the highest possible density and the lowest prices.

    $345.55
  • Inquiry

    Barium (Ba) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium (Ba) Sputtering Targets with the highest possible density and the lowest prices.

    $0.00
  • Inquiry

    Zinc Nitride (Zn3N2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zinc Nitride (Zn3N2) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Chromium Silicide (CrSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Chromium Silicide (CrSi2) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Cerium Fluoride (CeF3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cerium Fluoride (CeF3) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Chromium-doped Silicon Monoxide (SiO/Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Chromium-doped Silicon Monoxide (SiO/Cr) Sputtering Targets with the highest possible density and the lowest...

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  • Inquiry

    Titanium Aluminum (Ti/Al) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Aluminum (Ti/Al) Sputtering Targets with the highest possible density and the lowest prices.

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