• sputtering-targets

    Sputtering 

    Targets

    Heeger Materials (HM) provides various of sputtering targets at a competitive price. HM stocks a vast assortment of sputtering targets and provides customized services.

  • Refractory Metals

    Refractory

    Metals

    Heeger Materials (HM) provides various of refractory metals at a competitive price. HM stocks a vast assortment of refractory metals and provides customized services.

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    Terbium Oxide (Tb4O7) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Terbium Oxide (Tb4O7) Sputtering Targets with the highest possible density and the lowest prices.

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    Titanium (Ti) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium (Ti) Sputtering Targets with the highest possible density and the lowest prices.

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    Copper Cobalt (Cu/Co) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Cobalt (Cu/Co) Sputtering Targets with the highest possible density and the lowest prices.

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    Copper Chrome (Cu/Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Chrome (Cu/Cr) Sputtering Targets with the highest possible density and the lowest prices.

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    Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Targets with the highest possible density...

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    Barium Titanate (BaTiO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium Titanate (BaTiO3) Sputtering Targets with the highest possible density and the lowest prices.

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    Copper Indium Selenide (CuInSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Indium Selenide (CuInSe2) Sputtering Targets with the highest possible density and the lowest prices.

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    Titanium Fluoride (TiF3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Fluoride (TiF3) Sputtering Targets with the highest possible density and the lowest prices.

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Heeger Materials Inc

Heeger Materials Inc - Advanced Material Supplier

Your materials specialist of high purity powder, metal and alloy.

Heeger Materials Inc is a global manufacturer and distributor of advanced materials with a more than 20,000 online products catalog and compendium of information on the chemical elements, advanced materials, and high technology applications. Our main materials are Rare Earth Materials, Refractory Metals, Thin Film Materials and High Purity Materials. Our advanced materials make your world better, enabling technologies to provide a safer, more sustainable future.