• sputtering-targets

    Sputtering 

    Targets

    Heeger Materials (HM) provides various of sputtering targets at a competitive price. HM stocks a vast assortment of sputtering targets and provides customized services.

  • Refractory Metals

    Refractory

    Metals

    Heeger Materials (HM) provides various of refractory metals at a competitive price. HM stocks a vast assortment of refractory metals and provides customized services.

  • Inquiry

    Titanium Selenide (TiSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Selenide (TiSe2) Sputtering Targets with the highest possible density and the lowest prices.

    $0.00
  • Inquiry

    Tungsten Selenide (WSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Tungsten Selenide (WSe2) Sputtering Targets with the highest possible density and the lowest prices.

    $0.00
  • Inquiry

    Nickel Vanadium (Ni/V) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Nickel Vanadium (Ni/V) Sputtering Targets with the highest possible density and the lowest prices.

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  • $404.25
    Sale!

    Inquiry

    Molybdenum Disulfide (MoS2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Molybdenum Disulfide (MoS2) Sputtering Target with the highest possible density and the lowest prices.

    $404.25
  • Inquiry

    Manganese Copper (Mn/Cu) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Manganese Copper (Mn/Cu) Sputtering Targets with the highest possible density and the lowest prices.

    $0.00
  • Inquiry

    Titanium Tungsten (Ti/W) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Tungsten (Ti/W) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Iron Aluminum (Fe/Al) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Iron Aluminum (Fe/Al) Sputtering Targets with the highest possible density and the lowest prices.

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  • Inquiry

    Aluminum Titanium (Al/Ti) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Aluminum Titanium (Al/Ti) Sputtering Targets with the highest possible density and the lowest prices.

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