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Nickel Silicide (NiSi2) Sputtering Target
Nickel Silicide (NiSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Nickel Silicide (NiSi2) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockThorium Fluoride (ThF4) Sputtering Target
Thorium Fluoride (ThF4) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Thorium Fluoride (ThF4) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockPraseodymium Calcium Manganate...
Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets with the highest possible density...
$0.00In StockZinc Tin (Zn/Sn) Sputtering Target
Zinc Tin (Zn/Sn) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Zinc Tin (Zn/Sn) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockTitanium Nitride (TiN) Sputtering Target
Titanium Nitride (TiN) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Nitride (TiN) Sputtering Target with the highest possible density and the lowest prices.
$356.48In StockBarium Zirconate (BaZrO3) Sputtering Target
Barium Zirconate (BaZrO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium Zirconate (BaZrO3) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockErbium Oxide (Er2O3) Sputtering Target
Erbium Oxide (Er2O3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Erbium Oxide (Er2O3) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In Stock
Iridium (Ir) Sputtering Target
Iridium (Ir) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Iridium (Ir) Sputtering Targets with the highest possible density and the lowest prices.
Heeger Materials Inc
Heeger Materials Inc - Advanced Material Supplier
Your materials specialist of high purity powder, metal and alloy.
Heeger Materials Inc is a global manufacturer and distributor of advanced materials with a more than 20,000 online products catalog and compendium of information on the chemical elements, advanced materials, and high technology applications. Our main materials are Rare Earth Materials, Refractory Metals, Thin Film Materials and High Purity Materials. Our advanced materials make your world better, enabling technologies to provide a safer, more sustainable future.