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Terbium Oxide (Tb4O7) Sputtering Target
Terbium Oxide (Tb4O7) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Terbium Oxide (Tb4O7) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockTitanium (Ti) Sputtering Target
Titanium (Ti) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium (Ti) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockCopper Cobalt (Cu/Co) Sputtering Target
Copper Cobalt (Cu/Co) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Cobalt (Cu/Co) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockCopper Chrome (Cu/Cr) Sputtering Target
Copper Chrome (Cu/Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Chrome (Cu/Cr) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockLanthanum Calcium Manganate...
Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum Calcium Manganate (La0.67Ca0.33MnO3) Sputtering Targets with the highest possible density...
$0.00In StockBarium Titanate (BaTiO3) Sputtering Target
Barium Titanate (BaTiO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Barium Titanate (BaTiO3) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockCopper Indium Selenide (CuInSe2)...
Copper Indium Selenide (CuInSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Copper Indium Selenide (CuInSe2) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In StockTitanium Fluoride (TiF3) Sputtering Target
Titanium Fluoride (TiF3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Titanium Fluoride (TiF3) Sputtering Targets with the highest possible density and the lowest prices.
$0.00In Stock
Heeger Materials Inc
Heeger Materials Inc - Advanced Material Supplier
Your materials specialist of high purity powder, metal and alloy.
Heeger Materials Inc is a global manufacturer and distributor of advanced materials with a more than 20,000 online products catalog and compendium of information on the chemical elements, advanced materials, and high technology applications. Our main materials are Rare Earth Materials, Refractory Metals, Thin Film Materials and High Purity Materials. Our advanced materials make your world better, enabling technologies to provide a safer, more sustainable future.