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    Sputtering targets

    Heeger Materials offers a wide range of high purity sputtering targets included pure metal and alloy targets; oxides, fluorides, and nitrides targets, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.

    Heeger Materials (HM) will contact you with the price and availability of these items in ...

    Heeger Materials offers a wide range of high purity sputtering targets included pure metal and alloy targets; oxides, fluorides, and nitrides targets, as well as customized targets. Available in many sizes, purities, and compositions at a competitive price.

    Heeger Materials (HM) will contact you with the price and availability of these items in 24 hours.

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    Sputtering targets There are 337 products.

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    Showing 1 - 12 of 337 items
    • $94.53 In Stock
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      Aluminum (Al) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Aluminum (Al) Sputtering Target with the highest possible density and the lowest prices. 

      $94.53
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    • $216.83 In Stock
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      Antimony (Sb) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Antimony (Sb) Sputtering Target with the highest possible density and the lowest prices.

      $216.83
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    • $231.53 In Stock
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      Cadmium (Cd) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cadmium (Cd) Sputtering Target with the highest possible density and the lowest prices.

      $231.53
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    • $91.01 In Stock
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      Chromium (Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Chromium (Cr) Sputtering Target with the highest possible density and the lowest prices.

      $91.01
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    • $525.53 In Stock
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      Europium (Eu) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Europium (Eu) Sputtering Target with the highest possible density and the lowest prices.

      $525.53
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    • $264.60 In Stock
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      Gadolinium (Gd) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Gadolinium (Gd) Sputtering Target with the highest possible density and the lowest prices.

      $264.60
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    • $94.00 In Stock
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      Germanium (Ge) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Germanium (Ge) Sputtering Target with the highest possible density and the lowest prices.

      $94.00
      In Stock
    • $158.03 In Stock
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      Hafnium (Hf) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Hafnium (Hf) Sputtering Target with the highest possible density and the lowest prices.

      $158.03
      In Stock
    • $438.56 In Stock
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      Holmium (Ho) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Holmium (Ho) Sputtering Target with the highest possible density and the lowest prices.

      $438.56
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    • $149.89 In Stock
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      Indium (In) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Indium (In) Sputtering Target with the highest possible density and the lowest prices.

      $149.89
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    • $385.88 In Stock
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      Lanthanum (La) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum (La) Sputtering Target with the highest possible density and the lowest prices.

      $385.88
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    • $88.20 In Stock
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      Lead (Pb) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lead (Pb) Sputtering Target with the highest possible density and the lowest prices.

      $88.20
      In Stock
    Showing 1 - 12 of 337 items

    Sputtering Targets:

    According to the types of materials, there are many classification methods for target materials, including metal and alloy targets, inorganic nonmetallic targets, and composite targets. Inorganic nonmetallic targets are divided into oxides, slides, nitride, and fluoride. At present, the most commonly used classification methods are divided according to the application of target materials, mainly including application target material in the semiconductor field, target material for the recording medium, target material for display film, optical target material, superconducting target material, etc. The composition and specific uses of the main target materials are listed in the following table.

    Classify:

    Semiconductor-associated target material, Magnetic recording target material, Photo recording target material, Display target material, Other application target material

    Spluttering is one of the main techniques for preparing thin-film materials, which uses ions generated by ion sources to form high-velocity ion beams through accelerated aggregation in a vacuum, pounding the solid surface and undergo kinetic energy exchange, making the yard of the solid surface leave the solid and deposit on the substrate surface. The bombarded solids are raw materials for the deposited thin film by a sputtering method, called sputtering targets.