Molybdenum Niobium Alloy (Mo10Nb) Sputtering Target

New product

Molybdenum Niobium Alloy (Mo10Nb) sputtering target can be used in integrated circuits, thin-film transistor liquid crystal display (TFT-LCD). Heeger Materials has been developing and successfully producing custom sputtering targets in Molybdenum Niobium Alloy (Mo10Nb) alloys along with its other core competency materials: Tantalum (Ta), niobium (Nb), and tungsten (W).

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Data sheet

Diameter1" -10"
MaterialsMo10Nb
Thickness0.125" - 1.000"

More info

Heeger Materials has been developing and successfully producing custom sputtering targets in Molybdenum Niobium Alloy (Mo10Nb) alloys along with its other core competency materials: Tantalum (Ta), niobium (Nb), and tungsten (W).

  • Segmented Molybdenum Niobium Alloy sputtering targets for flat panel display manufacturing Round tungsten sputtering targets for semiconductor manufacturing (99.95% or 99.9995% purity)
  • All products are built to customer / OEM specifications

                                                   

Specification of Molybdenum Niobium Alloy Planar Sputter Target

Product

Molybdenum Niobium Alloy Planar Sputtering Target

Size

Customized

Regular: 8-12mm T x 300mm x 600mm

purity

99.9%, 99.95%

Packaging

Contact sales@heegermaterials.com for current pricing or for a quote on Molybdenum Niobium Alloy Sputtering Target and other Molybdenum Niobium Alloy products not listed.

Our Molybdenum Niobium Alloy Sputtering Target will be packed in a wooden case or carton supported with soft materials to ensure that the products thus packed will not shift inside the cases.

 

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