Indium (In) Sputtering Target can be...
Indium (In) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Indium (In) Sputtering Target with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Indium is a soft, ductile, manleable, lustrous metallic metal. Most indium is used to make indium tin oxide (ITO), which is an important part of touch screens, flatscreen TVs and solar panels. This is because it conducts electricity, bonds strongly to glass and is transparent. Indium nitride, phosphide and antimonide are semiconductors used in transistors and microchips. Indium metal is an important metal which can be used as the binder in sputtering target bonding. The antomic mass of Indium is 114.818 amu and the melting point is 156.61 °C (429.76 K, 313.898 °F). The density is 7.31 and the crystal is Tetragonal. Besides sputtering target, we also can offer Indium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Indium (In) Sputtering Target:99.9% - 99.999%
Other Shape for Indium (In) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Indium (In) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.
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