Magnesium (Mg) Sputtering Target can...
Magnesium (Mg) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Magnesium (Mg) Sputtering Target with the highest possible density and the lowest prices.
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Magnesium is very chemically active metal. Magnesium alloys are useful in aeroplane and car construction since its low density.Magnesium sulfate is sometimes used as a mordant for dyes. Magnesium hydroxide is added to plastics to make them fire retardant. Magnesium oxide is used to make heat-resistant bricks for fireplaces and furnaces. It is also added to cattle feed and fertilisers. Magnesium hydroxide (milk of magnesia), sulfate (Epsom salts), chloride and citrate are all used in medicine. The antomic mass of Magnesium is 24.305 amu and the melting point is 650.0 °C (923.15 K, 1202.0 °F). The density is 1.738 and the crystal is Hexagonal. Besides sputtering target, we also can offer Magnesium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Magnesium (Mg) Sputtering Target:99.9% - 99.99%
Other Shape for Magnesium (Mg) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Magnesium (Mg) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.