Manganese (Mn) Sputtering Target can...
Manganese (Mn) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Manganese (Mn) Sputtering Target with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Manganese is a pinkinsh-gray, chemically active element, which is mainly used in alloys, such as steel.Manganese(IV) oxide is used as a catalyst, a rubber additive and to decolourise glass that is coloured green by iron impurities. Manganese sulfate is used to make a fungicide. Manganese(II) oxide is a powerful oxidising agent and is used in quantitative analysis. It is also used to make fertilisers and ceramics. The antomic mass of Manganese is 54.93805 amu and the melting point is 1245.0 °C (1518.15 K, 2273.0 °F). The density is 7.43 and the crystal is Cubic. Besides sputtering target, we also can offer Manganese powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Manganese (Mn) Sputtering Target:99.5% - 99.95%
Other Shape for Manganese (Mn) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Manganese (Mn) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.