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Tantalum (Ta) Sputtering Target

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Tantalum (Ta) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Tantalum (Ta) Sputtering Target with the highest possible density and the lowest prices.

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$147.00

  • 99.9%

Data sheet

SymbolTa
Purity99.9%

More info

Tantalum is a shiny, silvery metal that is very resistant to corrosion. One of the main uses of tantalum is in the production of electronic components.  Because tantalum can be used to coat other metals with a very thin layer, a high capacitance can be achieved in a small volume. This makes tantalum capacitors attractive for portable electronics such as mobile phones. It is very resistant to corrosion and so is used in equipment for handling corrosive materials.  The antomic mass of Tantalum is 180.9479 amu and the melting point is 2996.0 °C (3269.15 K, 5424.8 °F). The density is 16.6 and the crystal is Cubic. Besides sputtering target, we also can offer Tantalum  powder, bar, sheet, foil, disc, ribbon and filaments.

Tantalum (Ta) Sputtering Target

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Other Purity for Tantalum (Ta) Sputtering Target:99.9% - 99.95%

Other Shape for Tantalum (Ta) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made

Packing: The Tantalum (Ta) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

  sputtering-target packing1.jpgsupptering-target packing2.jpg

Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.

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