Vanadium (V) Sputtering Target can be...
Vanadium (V) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Vanadium (V) Sputtering Target with the highest possible density and the lowest prices.
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Vanadium is a silvery metal that resists corrosion. About 80% of the vanadium produced is used as a steel additive. Vanadium-steel alloys are very tough and are used for armour plate, axles, tools, piston rods and crankshafts. Less than 1% of vanadium, and as little chromium, makes steel shock resistant and vibration resistant. Vanadium alloys are used in nuclear reactors because of vanadium’s low neutron-absorbing properties. Vanadium(V) oxide is used as a pigment for ceramics and glass, as a catalyst and in producing superconducting magnets. The antomic mass of Vanadium is 50.9415 amu and the melting point is 1890.0 °C (2163.15 K, 3434.0 °F). The density is 5.8 and the crystal is Cubic. Besides sputtering target, we also can offer Vanadium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Vanadium (V) Sputtering Target:99.5% - 99.9%
Other Shape for Vanadium (V) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Vanadium (V) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.