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Calcium (Ca) Sputtering Target

HTST280

New product

Calcium (Ca) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Calcium (Ca) Sputtering Targets with the highest possible density and the lowest prices.

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Data sheet

Shaperound/rectangular/Delta/Customized
Purity99% - 99.5%

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Calcium (Ca) is a  the fifth element and the third most abundant metal in the earth’s crust. Calcium metal is trimorphic, harder than sodium, but softer than aluminium. It is used in aluminium alloys for bearings, as a helper in the bismuth removal form lead, as well as in controlling graphitic carbon in melted iron. Calcium is an alloying used in the production of alluminium, beryllium, copper, lead and magnesium alloys. The antomic mass of Calcium is 40.078 amu and the melting point is 839.0 °C (1112.15 K, 1542.2 °F). The density is 1.55 and the crystal is Cubic. Besides sputtering target, we also can offer Calcium  powder, bar, sheet, foil, disc, ribbon and filaments.

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Packing: The Calcium (Ca) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

  sputtering-target packing1.jpgsupptering-target packing2.jpg

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