Cerium (Ce) Sputtering Target can be...
Cerium (Ce) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Cerium (Ce) Sputtering Targets with the highest possible density and the lowest prices.
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|Purity||99.9% - 99.95%|
Cerium (Ce) is a malleable, soft, ductile, iron-grey metal, slightly harder than lead. It is packed in oil since it is very reactive. Cerium will be oxidated slowly in cold water and rapidly in hot water. Cerium is used in aluminium alloys for bearings, it is also used as a deoxidizer in the manufacture of many steels; as a reducing agent in the preparation of metals as chromium, thorium, zirconium and uranium. The antomic mass of Cerium is 140.116 amu and the melting point is 795.0 °C (1068.15 K, 1463.0 °F). The density is 6.773 and the crystal is Cubic. Besides sputtering target, we also can offer Cerium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Cerium (Ce) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
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