Graphite (C) Sputtering Target can be...
Graphite (C) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Graphite (C) Sputtering Targets with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
|Purity||99.9% - 99.999%|
Carbon is unique among the elements in its ability to form strongly bonded chains, sealed off by hydrogen atoms. Graphite is used in pencils, to make brushes in electric motors and in furnace linings. The antomic mass of Carbon is 12.0107 amu and the melting point is 3500.0 °C (3773.15 K, 6332.0 °F). The density is 2.62 and the crystal is Hexagonal. Besides sputtering target, we also can offer Graphite powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Graphite (C) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.