Iron (Fe) Sputtering Target can be...
Iron (Fe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Iron (Fe) Sputtering Targets with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
|Purity||99.9% - 99.95%|
Iron is a lustrous, ductile, malleable, silver-gray metal, which can be used to manufacture steel. Thanks to the combination of low cost and high strength it is indispensable. Its applications go from food containers to family cars, from scredrivers to washing machines, from cargo ships to paper staples. The antomic mass of Iron is 55.845 amu and the melting point is 1535.0 °C (1808.15 K, 2795.0 °F). The density is 7.86 and the crystal is Cubic. Besides sputtering target, we also can offer Iron powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Iron (Fe) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.