Rhenium (Re) Sputtering Target can be...
Rhenium (Re) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Rhenium (Re) Sputtering Targets with the highest possible density and the lowest prices.
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|Purity||99.9% - 99.99%|
Rhenium is a metal with a very high melting point. Rhenium is used as an additive to tungsten- and molybdenum-based alloys to give useful properties. Rhenium catalysts are extremely resistant to poisoning (deactivation) and are used for the hydrogenation of fine chemicals. Some rhenium is used in nickel alloys to make single-crystal turbine blades. The antomic mass of Rhenium is 186.207 amu and the melting point is 3180.0 °C (3453.15 K, 5756.0 °F). The density is 21.02 and the crystal is Hexagonal. Besides sputtering target, we also can offer Rhenium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Rhenium (Re) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.