Rhodium (Rh) Sputtering Target can be...
Rhodium (Rh) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Rhodium (Rh) Sputtering Targets with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
|Purity||99.9% - 99.99%|
Rhodium is a hard, shiny, silvery metal. The major use of rhodium is in catalytic converters for cars (80%). It reduces nitrogen oxides in exhaust gases. Rhodium is also used as catalysts in the chemical industry, for making nitric acid, acetic acid and hydrogenation reactions.
The antomic mass of Rhodium is 102.9055 amu and the melting point is 1966.0 °C (2239.15 K, 3570.8 °F). The density is 12.41 and the crystal is Cubic. Besides sputtering target, we also can offer Rhodium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Rhodium (Rh) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.