Sale! N-type Silicon (Si) Sputtering Target View larger

N-type Silicon (Si) Sputtering Target


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N-type Silicon (Si) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity N-type Silicon (Si) Sputtering Targets with the highest possible density and the lowest prices.

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Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.


Data sheet

Purity99.9% - 99.999%

More info

Silicon is a solid with a blue-grey metallic sheen. Silicon is used extensively as a semiconductor in solid-state devices in the computer and microelectronics industries. Silicon carbides are important abrasives and are also used in lasers. The antomic mass of Silicon is 28.0855 amu and the melting point is 1410.0 °C (1683.15 K, 2570.0 °F). The density is 2.329 and the crystal is Cubic. Besides sputtering target, we also can offer Silicon  powder, bar, sheet, foil, disc, ribbon and filaments.

Silicon (Si) Sputtering Target

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Packing: The N-type Silicon (Si) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

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Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.

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