Yttrium (Y) Sputtering Target can be...
Yttrium (Y) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Yttrium (Y) Sputtering Targets with the highest possible density and the lowest prices.
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|Purity||99.5% - 99.99%|
Yttrium is a soft, silvery metal. Yttrium is often used as an additive in alloys. It increases the strength of aluminium and magnesium alloys. It is also used in the making of microwave filters for radar and has been used as a catalyst in ethene polymerisation. Yttrium-aluminium garnet (YAG) is used in lasers that can cut through metals. It is also used in white LED lights. Yttrium oxide is added to the glass used to make camera lenses to make them heat and shock resistant. It is also used to make superconductors. Yttrium oxysulfide used to be widely used to produce red phosphors for old-style colour television tubes. The antomic mass of Yttrium is 88.90585 amu and the melting point is 1523.0 °C (1796.15 K, 2773.4 °F). The density is 4.469 and the crystal is Hexagonal. Besides sputtering target, we also can offer Yttrium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Packing: The Yttrium (Y) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
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