Sale! Lanthanum Aluminate (LaAlO3) Sputtering Target-heegermaterials View larger

Lanthanum Aluminate (LaAlO3) Sputtering Target

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Lanthanum Aluminate (LaAlO3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum Aluminate (LaAlO3) Sputtering Target with the highest possible density and the lowest prices.

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  • 99.9%

Data sheet


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LaAlO3 single crystal is the most important single crystal material for large scale high temperature superconducting film substrate. It is grown by the pull-up method to produce single crystals and substrates 2 inches or more in diameter. It matches well with Ybacuo and other high temperature superconducting materials and lattices, has low dielectric constant and low microwave loss, so it is suitable for making high temperature superconducting microwave electronic devices (such as high temperature superconducting microwave filter in remote communication). It has great practical and potential application prospect.

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Other Purity for Lanthanum Aluminate (LaAlO3) Sputtering Target:99.9%

Other Shape for Lanthanum Aluminate (LaAlO3) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made

Packing: The Lanthanum Aluminate (LaAlO3) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

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