Sale! Molybdenum Chromium (Mo/Cr) Sputtering Target-heegermaterials View larger

Molybdenum Chromium (Mo/Cr) Sputtering Target

HTST361

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Molybdenum Chromium (Mo/Cr) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Molybdenum Chromium (Mo/Cr) Sputtering Targets with the highest possible density and the lowest prices.

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Data sheet

Shaperound/rectangular/Delta/Customized
Purity99.9% - 99.95%

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Chemical Formula: Mo/Cr

CAS Number: 7439-98-7 | 7440

Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Molybdenum chromium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Packing: The Molybdenum Chromium (Mo/Cr) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

  sputtering-target packing1.jpgsupptering-target packing2.jpg

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