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Lanthanum Oxide (La2O3) Sputtering Target

HTST423

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Lanthanum Oxide (La2O3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Lanthanum Oxide (La2O3) Sputtering Targets with the highest possible density and the lowest prices.

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Data sheet

Shaperound/rectangular/Delta/Customized
Purity99.9% - 99.99%

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We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Lanthanum oxide are mainly used in manufacturing special alloy precision optical glass, high refraction optical fiber board, suitable for camera, camera, microscope lens and optical instrument prism, etc. Also used in the manufacture of ceramic capacitors, piezoelectric ceramic additives and X - ray luminescent materials such as lanthanum oxide powder. Used as a catalyst for a variety of reactions, such as the oxidation of carbon monoxide when doped with cadmium and the hydrogenation of carbon monoxide to methane when doped with palladium. Lanthanum oxide impregnated with lithium oxide or zirconia (1%) can be used to make ferrite magnets. 

Lanthanum Oxide La2O3 is applied in petroleum and environment protection catalysts, polishing powders and Rare Earth fertilizers. 

Packing: The Lanthanum Oxide (La2O3) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

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