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Titanium Pentoxide (Ti3O5) Sputtering Target

HTST449

New product

Titanium Pentoxide (Ti3O5) Sputtering Target can be used in semiconductors, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display, and optical applications. HM specializes in producing high purity Titanium Pentoxide (Ti3O5) Sputtering Targets with the highest possible density and the lowest prices.

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Data sheet

Shaperound/rectangular/Delta/Customized
Purity99.9%

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Our Titanium Pentoxide (Ti3O5) Sputtering Target increased steadily, good quality and stable performance; hot sell both at home and abroad, widely obtains the customers of the recognition and praise, while established long-term stable cooperative relations with customers. We can also provide other titanium oxides, such as TiO2, Ti2O3, TiO2, TiO, etc.

We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources, and other deposition materials are listed by material throughout the website.

Ti3O5 Material Properties

CAS Number

Density (g/cm3)

Evaporation 

Temperature()

Refractive Index

 at 550nm

Transparency

Range(μm)

Evaporation Source

12065-65-5

4.89

1500~2000

2.2~2.3

0.4~8

RE,RS

Applications

AR coating; Beam Splitter; Cold light coating filter; HR coating; Glasses coating

Packing: The Titanium Pentoxide (Ti3O5) Sputtering Target is vacuum-sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

  sputtering-target packing1.jpgsupptering-target packing2.jpg

Please let us know the Purity and Shape you need and we'll give you feedback in 24 hours.

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