Boron Nitride (BN) Sputtering Target

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Condition: New product

Boron Nitride (BN) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Boron Nitride (BN) Sputtering Target with the highest possible density and the lowest prices.

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Data sheet

Symbol	BN
Purity	99.5%

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We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.

Other Purity for Boron Nitride (BN) Sputtering Target:99.5%

Other Shape for Boron Nitride (BN) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made

Packing: The Boron Nitride (BN) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.

sputtering-target packing1.jpg supptering-target packing2.jpg

Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.

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