Hafnium (Hf) Sputtering Target can be...
Hafnium (Hf) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Heeger Materials (HM) specializes in producing high purity Hafnium (Hf) Sputtering Target with the highest possible density and the lowest prices.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Hafnium is a lustrous, silvery, ductile metal which is similar with zirconium. Hafnium and its alloys are used for control rods in nuclear reactors and nuclear submarines because of its excellent at absorbing neutrons, very high melting point and corrosion resistant. Hafnium oxide is used as an electrical insulator in microchips, while hafnium catalysts have been used in polymerisation reactions. The antomic mass of Hafnium is 178.49 amu and the melting point is 2150.0 °C (2423.15 K, 3902.0 °F). The density is 13.2 and the crystal is Hexagonal. Besides sputtering target, we also can offer Hafnium powder, bar, sheet, foil, disc, ribbon and filaments.
We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies. Other sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website.
Other Purity for Hafnium (Hf) Sputtering Target:99.9% - 99.95%
Other Shape for Hafnium (Hf) Sputtering Target: Discs, Plates, Column Targets, Step Targets, Custom-made
Packing: The Hafnium (Hf) Sputtering Target are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
Lead time: 2-5 weeks for sputter target, 1-2 weeks for bonding.
Please let us know the Purity and Shape you need and we'll give you a feedback in 24 hours.